1961 Founded "Saito Corporation"
1962 Development of ball line hole machine for crystalline lattice model
1963 Successful miniaturization of electrostatic remover
1964 Development of low noise eliminator for electrical computers
1966 Development of electrostatic charging and attenuation meter
1970 Established Saito Kiken Co., LTD
1974 Development of spring-type nozzle system
1976 Spring Nozzle City Village Award
1977 Nagoya Office opened
1983 Development of electrostatic remover nozzle types
1988 Opened Chiba Technology
1989 Osaka Office opened (now: Osaka Branch)
1993 Changed its name to "Feisha Co., LTD." and opened its Tokyo office
1994 Set up Gunma technology
1995 Tochigi office opened
1996 Development of silicone molding system
FISA Corporation(USA) established in Tennessee, USA
1997 Chubu Branch opened (Nagoya office merged) Capital increased to 30 million yen
In cooperation with thermocoex, France.
2000 Development of ion detector in air FIC-2000 2002 Shanghai Office opened
2005FISA Techno Plaza opened
The electrostatic remover "FD series" was developed with the help of the Industrial Technology Research Institute
2009 FISA THAI TECHNO CO., LTD.
FISA TRADE(THAILAND) CO., LTD. (Now FISA MFG ASIA CO., LTD.)
Set up in Thailand
2010 Development of nozzle GH series, increased capital to 40 million yen
2011 Developed nozzle GTH series
2013 North Guandong Business Office (now: North Guandong Branch) opened
Development of the film device "ION BLADE"
2014 Development of hot runner nozzle VS series
Selected as one of Tokyo's 200 Outstanding Companies in 2016
2017 "Suzhou Feisha Hot Runner Trading Co., Ltd." was established in Suzhou, China
2018 Development of NHS series nozzles
2019 Achieved KES Environmental management system standard
2022 Develop nozzle AHS series
2023DYNAC Lab. Be completed
Developed hot runner nozzles SEPT series