1961 Founded "Saito Corporation" 1962 Development of ball line hole machine for crystalline lattice model 1963 Successful miniaturization of electrostatic remover 1964 Development of low noise eliminator for electrical computers 1966 Development of electrostatic charging and attenuation meter 1970 Established Saito Kiken Co., LTD 1974 Development of spring-type nozzle system 1976 Spring Nozzle City Village Award 1977 Nagoya Office opened 1983 Development of electrostatic remover nozzle types 1988 Opened Chiba Technology 1989 Osaka Office opened (now: Osaka Branch) 1993 Changed its name to "Feisha Co., LTD." and opened its Tokyo office 1994 Set up Gunma technology 1995 Tochigi office opened 1996 Development of silicone molding system FISA Corporation(USA) established in Tennessee, USA 1997 Chubu Branch opened (Nagoya office merged) Capital increased to 30 million yen In cooperation with thermocoex, France. 2000 Development of ion detector in air FIC-2000 2002 Shanghai Office opened 2005FISA Techno Plaza opened The electrostatic remover "FD series" was developed with the help of the Industrial Technology Research Institute 2009 FISA THAI TECHNO CO., LTD. FISA TRADE(THAILAND) CO., LTD. (Now FISA MFG ASIA CO., LTD.) Set up in Thailand 2010 Development of nozzle GH series, increased capital to 40 million yen 2011 Developed nozzle GTH series 2013 North Guandong Business Office (now: North Guandong Branch) opened Development of the film device "ION BLADE" 2014 Development of hot runner nozzle VS series Selected as one of Tokyo's 200 Outstanding Companies in 2016 2017 "Suzhou Feisha Hot Runner Trading Co., Ltd." was established in Suzhou, China 2018 Development of NHS series nozzles 2019 Achieved KES Environmental management system standard 2022 Develop nozzle AHS series 2023DYNAC Lab. Be completed Developed hot runner nozzles SEPT series